Innovating at the atomic level.

NanoClear Technologies was born from a vision to solve the problem of visibility degradation in optics. Inspired by the water-repellant qualities of the Lotus leaf, our co-founder Dr. Frank Greer spearheaded the development of Atomic Layer Polishing™ technology, marking the inception of a new era in surface engineering.

Applications & Advantages

How innovative Atomic Layer Polishing™ can revolutionize the surface smoothing process

Ultra Smooth Surfaces for Next Generation Semiconductors

Advanced smoothing across multiple surfaces without defects.

No Stress Cracking/Beveling

ALP™ achieves surface quality through atomic level molecular interaction. ALP™ does not bevel wafer outer edges or other structures on the wafer, increasing yield.

Multiple Substrate Smoothing

ALP™ has proven smoothing of 25 key substrates and uses specially formulated and "tunable" chemicals and gasses to achieve ultra-smooth properties.

Before ALP™

Gallium nitride (GaN) with an unpolished RMS of 0.60nm.

After ALP™

ALP™ delivered a significantly smoother 0.14nm surface finish, polishing with no scratches or debris.